Etching mechanism Of Y2O3 thin films in high density Cl-2/Ar plasma
DC Field | Value | Language |
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dc.contributor.author | Kim, YC | - |
dc.contributor.author | Kim, CI | - |
dc.date.available | 2019-05-30T09:38:46Z | - |
dc.date.issued | 2001-09 | - |
dc.identifier.issn | 0734-2101 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/25187 | - |
dc.description.abstract | In this study Y2O3 thin films were etched with an inductively coupled plasma. The etch rate of Y2O3 and the selectivity of Y2O3 to YMnO3 were investigated by varying the Cl-2/(Cl-2+Ar) gas mixing ratio. The maximum etch rate of Y2O3 and the selectivity of Y2O3 to YMnO3 were 302 Angstrom /min and 2.4, respectively, at a Cl-2/(Cl-2+Ar) gas mixing ratio of 0.2. Based on x-ray photoelectron spectroscopy analysis, it was concluded that die Y2O3 thin film was dominantly etched by Ar ion bombardment and was assisted by the chemical reaction of a Cl radical. This result was confirmed by secondary ion mass spectroscopy analysis with the presence of a Y-Cl bond at 124.4 (amu). (C) 2001 American Vacuum Society. | - |
dc.format.extent | 4 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | A V S AMER INST PHYSICS | - |
dc.title | Etching mechanism Of Y2O3 thin films in high density Cl-2/Ar plasma | - |
dc.type | Article | - |
dc.identifier.doi | 10.1116/1.1399316 | - |
dc.identifier.bibliographicCitation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.19, no.5, pp 2676 - 2679 | - |
dc.description.isOpenAccess | N | - |
dc.identifier.wosid | 000171376700096 | - |
dc.identifier.scopusid | 2-s2.0-0035443217 | - |
dc.citation.endPage | 2679 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 2676 | - |
dc.citation.title | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | - |
dc.citation.volume | 19 | - |
dc.type.docType | Article | - |
dc.publisher.location | 미국 | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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