Etching properties of SrBi2Ta2O9 thin films using CF4/Ar magnetically enhanced inductively coupled plasmas for FRAM
DC Field | Value | Language |
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dc.contributor.author | Kim, DP | - |
dc.contributor.author | Kim, CI | - |
dc.date.available | 2019-05-30T09:39:17Z | - |
dc.date.issued | 2001-07 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/25204 | - |
dc.description.abstract | Using a magnetically enhanced inductively coupled plasma (MEICP) system, we etched SrBi2Ta9O9 (SBT) thin films by varying the etch parameters, such as the gas mixing ratio, the rf power: the de bias voltage, and the chamber pressure. The maximum etch rate of the SET thin films was 1850 Angstrom /min at a gas mixing ratio of CF4(10)/Ar(90). 600 W, -350 V and 10 mTorr. The selectivities of SET over photoresist and SiO2 were about 0.95 and 0.6, respectively. The etch rate decreased with increasing CF4 gas mixing ratio in CF4/Ar plasmas, but the etch rate increased with increasing de bias voltage. The chemical reactions on the etched surfaces of SET films were investigated by using X-ray photoelectron spectroscopy and secondary ion mass spectrometry. | - |
dc.format.extent | 4 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | KOREAN PHYSICAL SOC | - |
dc.title | Etching properties of SrBi2Ta2O9 thin films using CF4/Ar magnetically enhanced inductively coupled plasmas for FRAM | - |
dc.type | Article | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.39, no.1, pp 189 - 192 | - |
dc.description.isOpenAccess | N | - |
dc.identifier.wosid | 000169870600040 | - |
dc.identifier.scopusid | 2-s2.0-0035602044 | - |
dc.citation.endPage | 192 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 189 | - |
dc.citation.title | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.citation.volume | 39 | - |
dc.type.docType | Article | - |
dc.publisher.location | 대한민국 | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Multidisciplinary | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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