극저온 CO2 세정공정을 위한 거친표면 위 미세입자의 점착특성 연구A study of minute particles’ adhesion on a rough surface for a cryogenic CO2 cleaning process
- Authors
- 석종원; 이성훈; 김필기
- Issue Date
- 2010
- Publisher
- 한국반도체디스플레이기술학회
- Keywords
- Cryogenic carbon dioxide cleaning; Contact mechanism; Particle adhesion mechanism; Adhesion modeling; Rough surface; G-T model; JKR model; Lennard-Jones potential
- Citation
- 반도체디스플레이기술학회지, v.9, no.1, pp 5 - 10
- Pages
- 6
- Journal Title
- 반도체디스플레이기술학회지
- Volume
- 9
- Number
- 1
- Start Page
- 5
- End Page
- 10
- URI
- https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/33749
- ISSN
- 1738-2270
- Abstract
- Among a variety of cleaning processes, the cryogenic carbon dioxide (CO2) cleaning has merits because it is highly efficient in removing very fine particles, innoxious to humans and does not produce residuals after the cleaning, which enables us to extend its area of coverage in the semi-conductor fabrication society. However, the cryogenic carbon dioxide cleaning method has some technical research issues in aspect to particles’ adhesion and removal. To resolve these issues, performing an analysis for the identification of particle adhesion mechanism is needed. In this study, a research using was performed by a theoretical approach. To this end, we extended the G-T (Greenwood-Tripp) model by applying the JKR (Johnson-Kendall-Roberts) and Lennard-Jones potential theories and the statistical characteristics of rough surface to investigate and identify the contact, adhesion and deformation mechanisms of soft or hard particles on the rough substrate. The statistical characteristics of the rough surface were taken into account through the employment of the normal probability distribution function of the asperity peaks on the substrate surface. The effects of surface roughness on the pull-off force for these particles were examined and discussed.
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