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Etching mechanisms of (Ba,Sr)TiO3 thin films in CF4/Ar inductively coupled plasma
Efremov, AM; Kim, DP; Kim, KT;
Kim, CI
Article
Issue Date
2004
Citation
MICROELECTRONIC ENGINEERING, v.71, no.1, pp 54 - 62
Publisher
ELSEVIER SCIENCE BV
1
Discover
Author
Kim, Chang Il
1
Efremov, AM
1
Kim, DP
1
Kim, KT
1
Subject
BST
1
CHLORINE PLASMAS
1
DISCHARGES
1
ELECTRON
1
electron temperature
1
etch rate
1
FLUORINE
1
GLOBAL-MODEL
1
ion-assisted etching
1
MODULATED HIGH-DENSITY
1
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