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Results 1-1 of 1 (Search time: 0.004 seconds).
The Dry Etching Properties of HfAlO3 Thin Films over Si and SiO2 Using Inductively Coupled Plasma Source
Woo, Jong-Chang; Joo, Young-Hee;
Kim, Chang-Il
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2013
Citation
FERROELECTRICS, v.457, no.1, pp 137 - 145
Publisher
TAYLOR & FRANCIS LTD
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Kim, Chang Il
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Woo, Jong-Chang
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Auger electron spectroscopy
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X-ray photoelectron spectroscopy
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2013
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ENG
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FERROELECTRICS
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