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Results 11-12 of 12 (Search time: 0.023 seconds).
유도결합플라즈마를 이용한 O2/BCl3/Ar가스에 따른 Indium Tin Oxide 박막의 식각 특성 연구
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위재형; 우종창;
김창일
Article
Issue Date
2010
Citation
전기전자재료학회논문지, v.23, no.10, pp 752 - 758
Publisher
한국전기전자재료학회
Etch Properties of HfO2 Thin Films using CH4/Ar Inductively Coupled Plasma
우종창; Gwan-Ha Kim; Dong-Pyo Kim;
김창일
Article
Issue Date
2007
Citation
Transactions on Electrical and Electronic Materials, v.8, no.6, pp 229 - 233
Publisher
한국전기전자재료학회
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Kim, Chang Il
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Woo, J.-C.
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Joo, Young-Hee
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Woo, Jong-Chang
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Choi, C.-A.
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Joo, Y.-H.
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Kim, H.-S.
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XPS
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Inductively coupled plasma
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Photoelectrons
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X ray photoelectron spectroscopy
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X-ray photoelectron spectroscopy
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AES
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AFM
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Chemical etching
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