Fabrication of Micro-Patterned 2D Nanorod and Nanohole Arrays by a Combination of Photolithography and Nanosphere Lithography
- Authors
- Park, Hoo Keun; Moon, Jung Ho; Yoon, Sungho; Do, Young Rag
- Issue Date
- 2011
- Publisher
- ELECTROCHEMICAL SOC INC
- Citation
- JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.158, no.5, pp J143 - J149
- Journal Title
- JOURNAL OF THE ELECTROCHEMICAL SOCIETY
- Volume
- 158
- Number
- 5
- Start Page
- J143
- End Page
- J149
- URI
- https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/46438
- DOI
- 10.1149/1.3556703
- ISSN
- 0013-4651
1945-7111
- Abstract
- This paper reports a facile fabrication technique for micro-patterned two-dimensional (2D) nanorod and nanohole arrays. This technique is based on a combination of two simple and scalable processes: photolithography for micro-patterns and nanosphere lithography (NSL) for nano-patterns. Mixed patterns, such as micro-scale line patterned 2D SiO2 nanoarrays, can be routinely fabricated over a quartz substrate owing to the high reproducibility of this simple method. In micro-patterned 2D nanoarrays, the structural dimensions of micro-patterns can be controlled by general optimization of photolithography techniques; structural dimensions of nano-patterns can be controlled with the NSL technique. We demonstrate micro-patterned fluorescence images of SrGa2S4:Eu2+ thin-film phosphors (TFPs) by depositing TFPs on micro-patterned 2D SiO2 photonic crystal (PC) nanoarrays using rf-magnetron sputtering technique. It is expected that photolithography-assisted NSL will be incorporated easily in the fabrication of micro-patterned PC for the various photonic or optoelectronic devices. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3556703] All rights reserved.
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