Molecular dynamics study of Al atom and Al-55 cluster deposition on Al substrates
- Authors
- Kang, JW; Choi, KS; Byun, KR; Hwang, HJ
- Issue Date
- Apr-2000
- Publisher
- KOREAN PHYSICAL SOC
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.36, no.4, pp 248 - 250
- Pages
- 3
- Journal Title
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY
- Volume
- 36
- Number
- 4
- Start Page
- 248
- End Page
- 250
- URI
- https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/47370
- ISSN
- 0374-4884
- Abstract
- We studied aluminum cluster deposition using by molecular dynamics simulation. The interaction between Al atoms nas calculated using by the tight-binding potential. We found the reason, in the case of cluster deposition, the FCC structure rearrangement occurs easily on the surface. Since the collision time between a cluster and the substrate is longer than that between a single atom and the surface, the substrate receives the thermal energy from energetic clusters during a long period and the thermal energy dissipates slowly. The thermal energy in the case of cluster deposition maintains a higher temperature longer than that in the case of atom deposition and leads to the self-annealing effect. Therefore, in the case of cluster deposition, self-annealing plays a very important role in the surface structure rearrangement.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - College of ICT Engineering > School of Electrical and Electronics Engineering > 1. Journal Articles
![qrcode](https://api.qrserver.com/v1/create-qr-code/?size=55x55&data=https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/47370)
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.