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열악한 환경에서 작동가능 가스센서 응용을 위한 4H-실리콘 카바이드 오믹접촉에 관한 전기적인 특성 연구

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dc.contributor.author이상권-
dc.date.accessioned2021-10-27T02:40:15Z-
dc.date.available2021-10-27T02:40:15Z-
dc.date.issued2004-
dc.identifier.issn0374-4914-
dc.identifier.issn2289-0041-
dc.identifier.urihttps://scholarworks.bwise.kr/cau/handle/2019.sw.cau/50782-
dc.description.abstractWe have investigated the electrical characteristics of three dierent stacks of ohmic contacts(TiW/Ti/Pt, TiW, and Ni/TaSix/Pt) on highly doped n-type 4H-silicon carbide for harsh environmentoperation gas sensor applications such as automotive and space aircraft applications. The rsttwo samples were tested at 500 600 C in a vacuum chamber for up to 300 hours. From our TLMmeasurement, TiW contacts with a Ti glue layer and a Pt capping layer have stable specic contactresistance at high temperature in a vacuum chamber. The long-term reliability tests of ohmiccontacts in an oxidizing environment (20 % O2/N2) for up to 520 hours showed that TiW/Ti/Pthad the better stability and the lower contact resistance while Ni/TaSix/Pt ohmic contacts had asevere contact degradation due to the oxidation at the interface. Therefore, we believe that ourTiW based metallization schemes can be applied to gas sensor operating in a harsh environmentsuch as an oxidizing ambient.-
dc.format.extent6-
dc.publisher한국물리학회-
dc.title열악한 환경에서 작동가능 가스센서 응용을 위한 4H-실리콘 카바이드 오믹접촉에 관한 전기적인 특성 연구-
dc.title.alternativeElectrical characterization of ohmic contacts to 4H-silicon carbide for harsh environment operation gas sensor applications-
dc.typeArticle-
dc.identifier.bibliographicCitation새물리, v.48, no.3, pp 254 - 259-
dc.identifier.kciidART000934219-
dc.description.isOpenAccessN-
dc.citation.endPage259-
dc.citation.number3-
dc.citation.startPage254-
dc.citation.title새물리-
dc.citation.volume48-
dc.publisher.location대한민국-
dc.subject.keywordAuthorSilicon carbide-
dc.subject.keywordAuthorOhmic contacts-
dc.subject.keywordAuthorTLM structure-
dc.subject.keywordAuthor4H-SiC-
dc.subject.keywordAuthorLong-term stability-
dc.subject.keywordAuthorSilicon carbide-
dc.subject.keywordAuthorOhmic contacts-
dc.subject.keywordAuthorTLM structure-
dc.subject.keywordAuthor4H-SiC-
dc.subject.keywordAuthorLong-term stability-
dc.description.journalRegisteredClasskci-
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