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Fabrication and integration of micro/nano-scale photonic devices and optical waveguide arrays for optical printed circuit board (O-PCB) and VLSI photonic applications

Authors
Lee, E.-H.Lee, S.G.O, B.H.Park, S.G.Kim, K.H.Kang, J.K.Choi, Y.W.
Issue Date
May-2005
Publisher
SPIE
Keywords
Microphotonics; Nanophotonics; Optical Interconnection; Photonic Crystal; Photonic Integration
Citation
Proceedings of SPIE - The International Society for Optical Engineering, v.5840 PART II, pp 523 - 533
Pages
11
Journal Title
Proceedings of SPIE - The International Society for Optical Engineering
Volume
5840 PART II
Start Page
523
End Page
533
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/56294
DOI
10.1117/12.607909
ISSN
0277-786X
Abstract
We report on the recent progresses of our work on the design, fabrication and integration of micro/nano-scale photonic devices and optical waveguide arrays for optical printed circuit boards (O-PCBs) and VLSI photonic applications. The waveguides are designed and fabricated by thermal embossing and ultraviolet (UV) radiated embossing of polymer materials. The photonic devices include vertically coupled surface emitting laser (VCSEL) microlasers, microlenses, 45-degree reflection couplers, directional couplers, arrayed waveguide grating structures, multimode interference (MMI) devices and photodetectors in micro/nano-scale. These devices are optically interconnected and integrated for O-PCB assembly and VLSI micro/nano-photonics. Detailed procedures of fabricating and implementing these devices and assembly of O-PCB are described. The O-PCBs are to perform the functions of transporting, switching, routing and distributing optical signals on flat modular boards or substrates. We report on the result of the optical transmission performances of these assembled O-PCBs up to 2.5 Gbps and 10 Gbps. For the design, fabrication, and VLSI integration of nano-scale photonic devices, we used photonic crystal structures. Characteristics of these devices are also described.
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