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Thin film instability and nanostructure formation: A molecular dynamics study

Authors
Han, M.Lee, J.S.Park, S.H.Choi, Y.K.
Issue Date
Mar-2004
Keywords
Molecular-dynamics simulation; Nanostructure; Thin film
Citation
2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004, v.3, pp 123 - 125
Pages
3
Journal Title
2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004
Volume
3
Start Page
123
End Page
125
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/56377
ISSN
0000-0000
Abstract
One of the recent studies showed that the structures can be self-constructed by controlling the instability of thin fluid film of a nano-scale [S.Y. Chou and L. Zhuang, J. Vac. Sci. and Technol. B, 17, 3197-3202 (1999)]. The Molecular dynamics simulation is used to probe the phenomena. And two sources of instability are investigated: the normal temperature gradient and the long-range attractive potential by the wall. In the first case, the wall temperature is controlled so that the film maintains its temperature gradient. It is observed that the growth rate decreases in a monotonic fashion. The effect of the surface tension gradient, rather than evaporation, may drive the growth. Another source of instability is considered that is the interaction between the upper wall and the fluid film through a potential originating from the interaction between ion and non-polar molecule. The solid potential induces the formation of one or more vertical structures. This may result from the distortion of the pressure distribution.
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