CF4/O2 gas 플라즈마를 이용한 폴리이미드 박막의 식각
DC Field | Value | Language |
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dc.contributor.author | 강필승 | - |
dc.contributor.author | 김창일 | - |
dc.contributor.author | 김상기 | - |
dc.date.accessioned | 2022-04-15T01:43:59Z | - |
dc.date.available | 2022-04-15T01:43:59Z | - |
dc.date.issued | 2002-05 | - |
dc.identifier.issn | 1226-7945 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/56589 | - |
dc.description.abstract | Polyimide (PI) films have been studied widely as the interlayer dielectric materials due to a low dielectric constant, low water absorption, high gap-fill and planarization capability. The polyimide film was etched using inductively coupled plasma system. The etching characteristics such as etch rate and selectivity were evaluated at different CF4/(CF4+O2) chemistry. The maximum etch rate was 8300 Å/min and the selectivity of polyimide to SiO2 was 5.9 at CF4/(CF4+O2) of 0.2. Etch profile of polyimide film with an aluminum pattern was measured by a scanning electron microscopy. The vertical profile was approximately 90o at CF4/(CF4+O2) of 0.2. As 20% CF4 were added into O2 plasma from the results of the optical emission spectroscopy, the radical densities of fluorine and oxygen increased with increasing CF4 concentration in CF4/O2 from 0 to 20%, resulting in the increased etch rate. The surface reaction of etched PI films was investigated using x-ray photoelectron spectroscopy. | - |
dc.publisher | 한국전기전자재료학회 | - |
dc.title | CF4/O2 gas 플라즈마를 이용한 폴리이미드 박막의 식각 | - |
dc.title.alternative | The Etching Characteristics of Polyimide Thin Films using CF4/O2 Gas Plasma | - |
dc.type | Article | - |
dc.identifier.bibliographicCitation | 전기전자재료학회논문지, v.15, no.5 | - |
dc.identifier.kciid | ART001191877 | - |
dc.description.isOpenAccess | N | - |
dc.citation.number | 5 | - |
dc.citation.title | 전기전자재료학회논문지 | - |
dc.citation.volume | 15 | - |
dc.publisher.location | 대한민국 | - |
dc.subject.keywordAuthor | Polyimide | - |
dc.subject.keywordAuthor | ICP | - |
dc.subject.keywordAuthor | OES | - |
dc.subject.keywordAuthor | XPS | - |
dc.subject.keywordAuthor | SEM | - |
dc.description.journalRegisteredClass | kci | - |
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