Design and Fabrication of Wire Grid Polarizer by Nanoimprinting and Glancing Angle Deposition Processes
- Authors
- Jang, Hyungjun; Shin, Ga-Young; Jang, Ho-Young; Ju, Jonghyun; Lim, Jiseok; Kim, Seok-min
- Issue Date
- Apr-2017
- Publisher
- JAPAN INST METALS
- Keywords
- wire grid polarizer; nano metal wire fabrication; glancing angle deposition; ultraviolet nanoimprinting
- Citation
- MATERIALS TRANSACTIONS, v.58, no.3, pp 494 - 498
- Pages
- 5
- Journal Title
- MATERIALS TRANSACTIONS
- Volume
- 58
- Number
- 3
- Start Page
- 494
- End Page
- 498
- URI
- https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/6206
- DOI
- 10.2320/matertrans.M2016219
- ISSN
- 1345-9678
1347-5320
- Abstract
- We report a simple and cost-effective fabrication method for a wire grid polarizer. The wire grid polarizer was fabricated by incorporating UV nanoimprinting and glancing angle deposition processes. A silicon pattern with a 40 nm line width, 100 nm pitch, and 100 nm height was fabricated by electron beam (E-beam) lithography and reactive ion etching processes. The UV nanoimprinting process was performed on a glass substrate and aluminum nanowires, with a height of 70 nm, were subsequently generated with a glancing angle deposition process. P-polarization transmittance above 55% and an extinction ratio of 31.1 similar to 6.1 were measured in the visible wavelength range.
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Collections - College of Engineering > School of Mechanical Engineering > 1. Journal Articles
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