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Etching Characteristics of TaNO Thin Film for Top Electrode Materials Using Inductivity Coupled CF4/Ar Plasma
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Woo, Jong-Chang | - |
| dc.contributor.author | Joo, Young-Hee | - |
| dc.contributor.author | Kang, Pil-Seung | - |
| dc.contributor.author | Kim, Chang-Il | - |
| dc.date.available | 2019-03-08T11:58:37Z | - |
| dc.date.issued | 2016-12 | - |
| dc.identifier.issn | 1533-4880 | - |
| dc.identifier.issn | 1533-4899 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/6352 | - |
| dc.description.abstract | In this research, we investigated the etch rate of TaNO thin film and selectivity with mask material (SiO2) in inductively coupled CF4/Ar plasma. As the CF4 content increased from 0% to 80% in CF4/Ar plasma, the etch rate of TaNO thin film was increased from 56.1 to 495.3 nm/min. The results of X-ray photoelectron spectroscopy (XPS) showed an efficient destruction of the oxide bonds by the ion bombardment as well as an accumulation of non-volatile byproducts on the etched surface of TaNO thin film. | - |
| dc.format.extent | 4 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | AMER SCIENTIFIC PUBLISHERS | - |
| dc.title | Etching Characteristics of TaNO Thin Film for Top Electrode Materials Using Inductivity Coupled CF4/Ar Plasma | - |
| dc.type | Article | - |
| dc.identifier.doi | 10.1166/jnn.2016.13683 | - |
| dc.identifier.bibliographicCitation | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.12, pp 12882 - 12885 | - |
| dc.description.isOpenAccess | N | - |
| dc.identifier.wosid | 000387279100123 | - |
| dc.identifier.scopusid | 2-s2.0-84994644908 | - |
| dc.citation.endPage | 12885 | - |
| dc.citation.number | 12 | - |
| dc.citation.startPage | 12882 | - |
| dc.citation.title | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | - |
| dc.citation.volume | 16 | - |
| dc.type.docType | Article | - |
| dc.publisher.location | 미국 | - |
| dc.subject.keywordAuthor | TaNO | - |
| dc.subject.keywordAuthor | Etching | - |
| dc.subject.keywordAuthor | OES | - |
| dc.subject.keywordAuthor | XPS | - |
| dc.subject.keywordAuthor | AES | - |
| dc.subject.keywordPlus | NITRIDE | - |
| dc.relation.journalResearchArea | Chemistry | - |
| dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
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