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Molecular dynamics simulations of energetic aluminum cluster deposition
- Authors
- Kang, J.W.; Hwang, H.J.
- Issue Date
- Apr-2002
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- 81.15.J; 07.05.Tp; 82.20.W
- Citation
- COMPUTATIONAL MATERIALS SCIENCE, v.23, no.1-4, pp 105 - 110
- Pages
- 6
- Journal Title
- COMPUTATIONAL MATERIALS SCIENCE
- Volume
- 23
- Number
- 1-4
- Start Page
- 105
- End Page
- 110
- ISSN
- 0927-0256
1879-0801
- Abstract
- We investigated energetic aluminum cluster deposition using a classical molecular dynamics (MD) simulation and the Metropolis Monte Carlo (MC) simulation. When local area reached melting state on the surface around impact point of an energetic aluminum cluster during it few ps. intermixing was easily achieved and a good epitaxial film with optimum bulk density was formed, For excellent film growth using cluster impact. it is necessary to make local area temperature higher than melting temperature on the surface around the impact point of an energetic cluster. (C) 2002 Elsevier Science B.V. All rights reserved.
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