Etchant-free patterning of silver nanowire transparent electrode using dry-film photoresists for organic light-emitting diodes

Abstract

This study demonstrates etchant-free patterning of silver nanowire (AgNW) films by utilizing a dry-film photoresist (DFR). The DFR was coated on an AgNW film by simple lamination, and then selectively cured under UV light using a photomask. During the stripping process, the AgNWs under the cured DFR were removed, while those under the uncured DFR remained intact and formed patterned electrodes. Clear edges were observed even for patterned electrodes with a line width of 50 mu m. To demonstrate a potential application, the patterned AgNW electrodes were embedded in a polymer planarization layer using hot pressing, and then used as bottom electrodes in blue organic light-emitting diodes (OLEDs). The OLEDs fabricated with the AgNW electrodes showed electroluminescence performance similar to that obtained using indium tin oxide (ITO) electrodes.