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Fast mapping of absorbing defects in optical materials by full-field photothermal reflectance microscopy

Authors
Choi, Woo JuneRyu, Seon YoungKim, Jun KiKim, Jae YoungKim, Dong UkChang, Ki Soo
Issue Date
Nov-2013
Publisher
OPTICAL SOC AMER
Citation
OPTICS LETTERS, v.38, no.22, pp 4907 - 4910
Pages
4
Journal Title
OPTICS LETTERS
Volume
38
Number
22
Start Page
4907
End Page
4910
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/67988
DOI
10.1364/OL.38.004907
ISSN
0146-9592
1539-4794
Abstract
We report a technique for rapidly mapping absorbing defects in optical materials, which act as laser-induced damage precursors, based on full-field photothermal reflectance microscopy. An intensity-modulated pump beam heats absorbing defects in the optical sample, creating localized, modulated refractive-index variations around the defects. A probe beam then illuminates the defect sites, and the measured amplitude of the reflectance variation is used to map the distribution of defects in the medium. Measurements show that this method offers a faster defect mapping speed of about 0.03 mm(2) per minute and a detectivity of a few tens of nanometers comparable to that of conventional scanning photothermal deflection microscopy. (C) 2013 Optical Society of America
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창의ICT공과대학 (전자전기공학부)
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