Control of optical nanometer gap shapes made via standard lithography using atomic layer depositionopen access
- Authors
- Rhie, Jiyeah; Lee, Dukhyung; Bahk, Young-Mi; Jeong, Jeeyoon; Choi, Geunchang; Lee, Youjin; Kim, Sunghwan; Hong, Seunghun; Kim, Dai-Sik
- Issue Date
- Apr-2018
- Publisher
- SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
- Keywords
- atomic layer deposition; standard lithography; nanometer gap; cross-sectional gap shape; field enhancement
- Citation
- JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, v.17, no.2
- Journal Title
- JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
- Volume
- 17
- Number
- 2
- URI
- https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/69940
- DOI
- 10.1117/1.JMM.17.2.023504
- ISSN
- 1932-5150
1932-5134
- Abstract
- Atomic layer deposition is an efficient method for coating a few nanometer-thick alumina over a wafer scale. This method combined with the standard photolithography process was presented to fabricate metallic nanometer gaps that optically act in terahertz regimes. However, the cross-sectional view of the gap shape of the metal-insulator-metal nanogap structure varies depending on the conditions from the stepwise procedure. In specific, selecting photoresist materials, adding ion milling and chemical etching processes, and varying metal thicknesses and substrates result in various optical gap widths and shapes. Since the cross-sectional gap shape affects the field enhancement of the tunneled electromagnetic waves via the nanogap, the control of tailoring the gap shape is necessary. Thus, we present five different versions of fabricating quadrangle-ring-shaped nanometer gap arrays with varying different kinds of outcomes. We foresee the usage of the suggested category for Specific applications. (C) The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License Distribution or repro-
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Collections - College of ICT Engineering > School of Electrical and Electronics Engineering > 1. Journal Articles
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