Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

Styrenic Block Copolymer-Based Pressure Sensitive Adhesives without Volatile Compounds Using Organic Eutectic Liquid

Authors
Choi, Gyeong HwanWooh, SanghyukKim, Chae Bin
Issue Date
Dec-2023
Publisher
American Chemical Society
Keywords
diluent; eutectic liquid; pressure sensitive adhesive; tackifier; thermoplastic elastomer
Citation
ACS Applied Polymer Materials, v.6, no.1, pp 607 - 615
Pages
9
Journal Title
ACS Applied Polymer Materials
Volume
6
Number
1
Start Page
607
End Page
615
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/72712
DOI
10.1021/acsapm.3c02228
ISSN
2637-6105
Abstract
Pressure sensitive adhesives (PSAs) based on styrenic block copolymers are commonly used in daily life and industry applications owing to their ability to rapidly adhere to surfaces with the application of low pressure at room temperature. Because of rising environmental issues, the demand for eco-friendly PSAs has considerably increased. In this regard, a nonvolatile organic eutectic liquid (EL) was developed as a substitute for the volatile organic diluent and tackifier, which are conventional components of PSAs. The poly(styrene-b-butadiene-b-styrene) (SBS) block copolymer was used as a model base polymer. The substitution of the diluent and tackifier by the EL considerably simplifies the PSA preparation process by eliminating the need for solution casting and solvent recovery steps. Additionally, it ensures the safety of manufacturers and users as the use of volatile and toxic components is avoided. Owing to the chemical structure similarity, the EL preferentially plasticized the polystyrene block, effectively increasing tackiness and enhancing damping properties at room temperature even at relatively low EL loadings (≤30 wt %). By simply incorporating EL into the SBS matrix, lap shear strength could be enhanced by 524% at most. Moreover, the use of the EL renders the SBS-based PSA particularly suitable for applications under rapid-shear conditions. © 2023 American Chemical Society.
Files in This Item
There are no files associated with this item.
Appears in
Collections
ETC > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Woo, Sanghyuk photo

Woo, Sanghyuk
공과대학 (화학공학과)
Read more

Altmetrics

Total Views & Downloads

BROWSE