Wide-bandgap p-type microcrystalline silicon oxycarbide using additional trimethylboron for silicon heterojunction solar cells
- Authors
- Kang, Dong-Won; Sichanugrist, Porponth; Zhang, He; Konagai, Makoto
- Issue Date
- May-2017
- Publisher
- WILEY
- Keywords
- microcrystalline; silicon oxycarbide; heterojunction; solar cell; trimethylboron
- Citation
- PROGRESS IN PHOTOVOLTAICS, v.25, no.5, pp 384 - 389
- Pages
- 6
- Journal Title
- PROGRESS IN PHOTOVOLTAICS
- Volume
- 25
- Number
- 5
- Start Page
- 384
- End Page
- 389
- URI
- https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/74910
- DOI
- 10.1002/pip.2875
- ISSN
- 1062-7995
1099-159X
- Abstract
- We report a new wide-bandgap p-type microcrystalline silicon oxycarbide (p-mu c-SiOxCy:H) film prepared by plasma-enhanced chemical vapor deposition. As an additional doping gas, trimethylboron was introduced into the standard processing gas-mixture of silane, carbon dioxide, hydrogen, and diborane. With both trimethylboron and diborane as doping gases, the optical bandgap (E-04) of the formed p-mu c-SiOxCy:H film was 0.18eV higher than that of reference microcrystalline silicon oxide (p-mu c-SiOx:H) processed with only diborane doping gas for the same levels of film thickness and electrical conductivity. To demonstrate the effectiveness of the developed p-layer, we applied it as an emitter in silicon heterojunction solar cells, which delivered a markedly high open circuit voltage of 0.702V and a power conversion efficiency of 18.9% based on a non-textured flat wafer. Copyright (C) 2017 John Wiley & Sons, Ltd.
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Collections - College of Engineering > School of Energy System Engineering > 1. Journal Articles
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