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Threshold voltage shift of amorphous oxide TFT with various channel length

Authors
Lee, Jeong-SooKim, Sun-JaePark, Hyun-SangPark, Sang-GuenKang, Dong-WonHan, Min-KooLee, Woo-GeunYoon, Kap-SooLee, Young-Wook
Issue Date
2009
Citation
IDW '09 - Proceedings of the 16th International Display Workshops, v.3, pp 1677 - 1680
Pages
4
Journal Title
IDW '09 - Proceedings of the 16th International Display Workshops
Volume
3
Start Page
1677
End Page
1680
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/74983
Abstract
We have fabricated amorphous oxide-based TFTs (thin-film transistors) which have various channel length of 7.5-34 pm and channel width of 40 pm and investigated electric characteristics such as threshold voltage (Vth) shift with various drain voltage (VDS). In case the length is less than 14 pm, Vth decreases with increasing VDS and Vth shift rapidly increases as the channel length becomes shorter. It is explained that short channel effect such as DIBL (Drain Induced Barrier Lowering) broke out until 14 pm in oxide TFTs. We also confirmed that Vth decreases with channel length shortened in oxide TFTs. These phenomena of occurrence of short channel effect for rather long channel in oxide TFTs comparing Si-Based TFTs and Vth variation could be explained with DIBL of back channel and band diagram of oxide TFTs, respectively.
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Kang, Dong-Won
공과대학 (에너지시스템 공학부)
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