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Cited 4 time in webofscience Cited 4 time in scopus
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Effect of chemical mechanical treatment on the optoelectronic properties in CMOS image sensor

Authors
Choi, EunmiKim, AreumKwon, Soon HyeongCui, YinhuaLee, Seon JeaLee, UkjaeChoi, Hee SooHahn, Sang JuneYoon, Sung PilSon, Hyung BinPyo, Sung Gyu
Issue Date
Feb-2015
Publisher
KOREAN INSTITUTE CHEMICAL ENGINEERS
Keywords
CMOS Image Sensor; CMP; Focal Length; White Sensitivity; Dead Zone
Citation
KOREAN JOURNAL OF CHEMICAL ENGINEERING, v.32, no.2, pp 199 - 201
Pages
3
Journal Title
KOREAN JOURNAL OF CHEMICAL ENGINEERING
Volume
32
Number
2
Start Page
199
End Page
201
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/9903
DOI
10.1007/s11814-014-0367-x
ISSN
0256-1115
1975-7220
Abstract
This paper presents the effect focal length variation by controlling chemical mechanical polishing (CMP) processes on the CIS optical performance. White sensitivity was drastically increased, and saturation signal variation and dead zone deviation were reduced. These experimental results showed that controlled focal length was able to increase CIS optoelectronic performance.
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College of Natural Sciences > Department of Physics > 1. Journal Articles

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Son, Hyungbin
창의ICT공과대학 (융합공학부)
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