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Effect of chemical mechanical treatment on the optoelectronic properties in CMOS image sensor
- Authors
- Choi, Eunmi; Kim, Areum; Kwon, Soon Hyeong; Cui, Yinhua; Lee, Seon Jea; Lee, Ukjae; Choi, Hee Soo; Hahn, Sang June; Yoon, Sung Pil; Son, Hyung Bin; Pyo, Sung Gyu
- Issue Date
- Feb-2015
- Publisher
- KOREAN INSTITUTE CHEMICAL ENGINEERS
- Keywords
- CMOS Image Sensor; CMP; Focal Length; White Sensitivity; Dead Zone
- Citation
- KOREAN JOURNAL OF CHEMICAL ENGINEERING, v.32, no.2, pp 199 - 201
- Pages
- 3
- Journal Title
- KOREAN JOURNAL OF CHEMICAL ENGINEERING
- Volume
- 32
- Number
- 2
- Start Page
- 199
- End Page
- 201
- ISSN
- 0256-1115
1975-7220
- Abstract
- This paper presents the effect focal length variation by controlling chemical mechanical polishing (CMP) processes on the CIS optical performance. White sensitivity was drastically increased, and saturation signal variation and dead zone deviation were reduced. These experimental results showed that controlled focal length was able to increase CIS optoelectronic performance.
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