Photochemically Activated Flexible Metal-Oxide Transistors and Circuits Using Low Impurity Aqueous System
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Heo, Jae-Sang | - |
dc.contributor.author | Kim, Jae-Hyun | - |
dc.contributor.author | Kim, Jaekyun | - |
dc.contributor.author | Kim, Myung-Gil | - |
dc.contributor.author | Kim, Yong-Hoon | - |
dc.contributor.author | Park, Sung Kyu | - |
dc.date.available | 2019-03-08T17:59:25Z | - |
dc.date.issued | 2015-02 | - |
dc.identifier.issn | 0741-3106 | - |
dc.identifier.issn | 1558-0563 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/9937 | - |
dc.description.abstract | High mobility flexible metal-oxide thin-film transistors and circuits have been fabricated on an ultrathin plastic substrate using environmentally benign aqueous solution system and low-temperature photochemical activation process (similar to 150 degrees C). Results show that the indium-gallium-zinc oxide (IGZO) thin-film transistors (TFTs) fabricated from nitrate-based precursors in aqueous solution outperform the devices from acetate-based precursors in alcohol solution. Here, IGZO TFTs and seven-stage ring oscillators are demonstrated on a 3 similar to 5 mu m-thick polyimide substrates with an average mobility of >6.9 cm(2)/V-s, subthreshold slope of similar to 0.14 V/decade, and oscillation frequency of similar to 340 kHz corresponding to 210 ns of propagation delay per stage at a supply bias of 20 V. | - |
dc.format.extent | 3 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
dc.title | Photochemically Activated Flexible Metal-Oxide Transistors and Circuits Using Low Impurity Aqueous System | - |
dc.type | Article | - |
dc.identifier.doi | 10.1109/LED.2014.2382136 | - |
dc.identifier.bibliographicCitation | IEEE ELECTRON DEVICE LETTERS, v.36, no.2, pp 162 - 164 | - |
dc.description.isOpenAccess | N | - |
dc.identifier.wosid | 000350334100026 | - |
dc.identifier.scopusid | 2-s2.0-84921890461 | - |
dc.citation.endPage | 164 | - |
dc.citation.number | 2 | - |
dc.citation.startPage | 162 | - |
dc.citation.title | IEEE ELECTRON DEVICE LETTERS | - |
dc.citation.volume | 36 | - |
dc.type.docType | Article | - |
dc.publisher.location | 미국 | - |
dc.subject.keywordAuthor | Aqueous solution | - |
dc.subject.keywordAuthor | photochemical activation | - |
dc.subject.keywordAuthor | sol-gel | - |
dc.subject.keywordAuthor | indium-gallium-zinc oxide | - |
dc.subject.keywordAuthor | thin-film transistor | - |
dc.subject.keywordAuthor | circuit | - |
dc.subject.keywordPlus | THIN-FILM TRANSISTORS | - |
dc.subject.keywordPlus | LOW-TEMPERATURE FABRICATION | - |
dc.subject.keywordPlus | HIGH-PERFORMANCE | - |
dc.subject.keywordPlus | ELECTRONICS | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.description.journalRegisteredClass | sci | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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