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Results 1-3 of 3 (Search time: 0.004 seconds).
Characteristics of CeO2 thin films etched with a high-density CF4/Ar plasma
Kim, DP;
Kim, CI
Article
Issue Date
2002
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.41, no.4, pp 519 - 523
Publisher
KOREAN PHYSICAL SOC
Effect of the gas mixing ratio on the plasma parameters and the gas phase composition in Cl-2/CF4 inductively coupled plasmas
Efremov, AM; Kim, DP;
Kim, CI
Article
Issue Date
2003
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.43, no.6, pp 1042 - 1048
Publisher
KOREAN PHYSICAL SOC
Dry etching of YMnO3 thin films in Ar/Cl-2 and CF4/Cl-2 plasmas
Kim, DP;
Kim, CI
Article
Issue Date
2003
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.43, no.5, pp 738 - 742
Publisher
KOREAN PHYSICAL SOC
1
Discover
Author
Efremov, AM
1
Subject
XPS
2
ACTINOMETRY
1
Ar/Cl-2
1
CeO2
1
CL-2-AR PLASMAS
1
Cl-2/CF4
1
DISCHARGES
1
dissociation
1
electron temperature
1
ELECTRON TEMPERATURES
1
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Date Issued
2003
2
2002
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Language
ENG
3
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