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Dry Etching Characteristics of Bi-0.5(Na0.82K0.18)(0.5)TiO3 Thin Films in Inductively Coupled Plasma Go to Link

Joo, Young-Hee; Woo, Jong-Chang; Kim, Chang-Il; Ahn, Chang-Won; Seog, Hae-Jin; Kim, Ill-Won

ArticleIssue Date2013CitationFERROELECTRICS, v.453, no.1, pp 44 - 53PublisherTAYLOR & FRANCIS LTD

The Dry Etching Properties of HfAlO3 Thin Films over Si and SiO2 Using Inductively Coupled Plasma Source Go to Link

Woo, Jong-Chang; Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2013CitationFERROELECTRICS, v.457, no.1, pp 137 - 145PublisherTAYLOR & FRANCIS LTD

The use of high density plasma system to improve the etch properties of the zinc tin oxide thin film for transparent thin film transistors active layers Go to Link

Woo, Jong-Chang; Chun, Yoon-Soo; Kim, Chang-Il

ArticleIssue Date2014CitationAPPLIED SURFACE SCIENCE, v.292, pp 915 - 920PublisherELSEVIER SCIENCE BV

Etching properties of Na0.5K0.5NbO3 thin films by using inductively coupled CF4/Ar plasma Go to Link

Joo, Young-Hee; Woo, Jong-Chang; Kim, Chang-Il

ArticleIssue Date2014CitationMICROELECTRONIC ENGINEERING, v.114, pp 1 - 6PublisherELSEVIER SCIENCE BV

Etch Characterization of TiO2 Thin Films Using Metal-Insulator-Metal Capacitor in Adaptively Coupled Plasma Go to Link

Woo, Jong-Chang; Joo, Young-Hee; Kim, Chang-Il

ArticleIssue Date2011CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.50, no.8PublisherIOP PUBLISHING LTD

Etch Properties of TiN Thin Film in Metal-Insulator-Metal Capacitor Using Inductively Coupled Plasma Go to Link

Park, Jung-Soo; Woo, Jong-Chang; Kim, Chang-Il

ArticleIssue Date2011CitationJAPANESE JOURNAL OF APPLIED PHYSICS, v.50, no.8PublisherIOP PUBLISHING LTD

The Dry Etching Properties of ZnO Thin Film in Cl2/BCl3/Ar Plasma

우종창; 김창일

ArticleIssue Date2010CitationTransactions on Electrical and Electronic Materials, v.11, no.3, pp 116 - 119Publisher한국전기전자재료학회

BCl₃/Ar 플라즈마에 Cl₂ 가스 첨가에 따른 TiN 박막의 식각 특성

엄두승; 우종창; 김동표; 김창일

ArticleIssue Date2008Citation전기전자재료학회논문지, v.21, no.12, pp 1051 - 1056Publisher한국전기전자재료학회

Dry Etching of Al2O3 Thin Films in O2/BCl3/Ar Inductively Coupled Plasma Go to Link

Xeng Yang; 우종창; Doo-Seung Um; 김창일

ArticleIssue Date2010CitationTransactions on Electrical and Electronic Materials, v.11, no.5, pp 202 - 205Publisher한국전기전자재료학회

Etching Characteristics of HfAlO3 Thin Films Using an Cl2/BCl3/Ar Inductively Coupled Plasma Go to Link

하태경; 우종창; 김창일

ArticleIssue Date2010CitationTransactions on Electrical and Electronic Materials, v.11, no.4, pp 166 - 169Publisher한국전기전자재료학회

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