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Atomic Layer Deposition Process of Hf-Based High-k Gate Dielectric Film on Si Substrate Go to Link

Park, Tae joo; Cho, Moonju; Jung, Hyung suk; Hwang, Cheol seong

ArticleIssue Date2012CitationHigh-k Gate Dielectrics for CMOS Technology, pp 77 - 110PublisherWILEY-VCH Verlag GmbH & Co.

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Front end of the line process Go to Link

Han, Jeong hwan; Cho, Moonju; Delabie, Annelies; Park, Tae joo; Hwang, Cheol seong

ArticleIssue Date2014CitationAtomic Layer Deposition for Semiconductors, pp 175 - 208PublisherSpringer US

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Reduced Electrical Defects and Improved Reliability of Atomic-Layer-Deposited HfO2 Dielectric Films by In Situ NH3 Injection Go to Link

Kim, Jeong Hwan; Park, Tae Joo; Cho, Moonju; Jang, Jae Hyuck; Seo, Minha; Na, Kwang Duk; Hwang, Cheol Seong; Won, Jeong Yeon

ArticleIssue Date2009CitationJournal of the Electrochemical Society, v.156, no.5, pp G48 - G52PublisherElectrochemical Society, Inc.

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Browsing by Cho, MoonjuAuthor

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