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Characterization of ammonium silicate residue during Polysilazane (PSZ) dry etching in NF3/H2O gas chemistryGo to Link

Kim, Hyun tae; Kim, Min su; Lee, Jong seok; Choi, Geun min; Park, Jin goo

ArticleIssue Date2017CitationECS Transactions, v.80, no.2, pp 211 - 219PublisherElectrochemical Society, Inc.
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