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Gate Engineering in TiN/La/TiN and TiLaN Metal Layers on Atomic-Layer-Deposited HfO2/SiGo to Link

Kim, Hyo Kyeom; Lee, Sang Young; Yu, Il-Hyuk; Park, Tae Joo; Choi, Rino; Hwang, Cheol Seong

ArticleIssue Date2012CitationIEEE Electron Device Letters, v.33, no.7, pp 955 - 957PublisherInstitute of Electrical and Electronics Engineers
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