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Effect of the H2/N2 Ratio on Molybdenum Nitride Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition: Applications for Next-Generation Interconnects Go to Link

Ha, Min-Ji; Kang, Na-Gyeong; Chung, Eun-Su; Ahn, Ji-Hoon

ArticleIssue Date2025CitationACS APPLIED NANO MATERIALS, v.8, no.25, pp 13130 - 13138PublisherAMER CHEMICAL SOC

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