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Browsing by Kim, M.-W.Author

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SCOPUS

Improving process window and resolution through source polarization in High-NA EUV

Chae, Y.-J.; Kim, M.-W.; Yu, D.-K.; Son, S.-W.; Michael-Yeung,; Oh, H.-K.

ArticleIssue Date2024CitationProceedings of SPIE - The International Society for Optical Engineering, v.13216PublisherSPIE

SCOPUS

Lifetime impact on residual stress of EUV pellicle Go to Link

Kim, M.-W.; Lee, S.-G.; Park, E.-S.; Oh, H.-K.

ArticleIssue Date2017CitationProceedings of SPIE - The International Society for Optical Engineering, v.10450PublisherSPIE

SCIESCOPUS

Overlay and CD uniformity variation due to wafer thermal deformation caused by EUV exposure Go to Link

Ko, H.-C.; Choi, W.-Y.; Kim, M.-W.; Kang, J.-W.; Jeon, J.-H.; You, D.-K.; Oh, H.-K.

ArticleIssue Date2023CitationJapanese Journal of Applied Physics, v.62, no.SG, pp 1 - 10PublisherInstitute of Physics

SCOPUS

Through pitch line width difference minimization by pixel source optimization

Kim, M.-W.; Yu, D.-K.; Chae, Y.-J.; Ko, H.-C.; Kang, J.-W.; Michael-Yeung,; Son, S.-W.; Oh, H.-K.

ArticleIssue Date2024CitationProceedings of SPIE - The International Society for Optical Engineering, v.13216, pp 1 - 6PublisherSPIE

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Browsing by Kim, M.-W.Author

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