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Area-selective atomic layer deposition of Al2O3 thin films for metal versus dielectric selectivity using vapor-dosed alkanethiolsGo to Link

Lee, Jinseon; Oh, Jiwoo; Lee, Jeongbin; Lee, Jeong-Min; Kim, Hyun Gu; Cho, Byungchul; Kim, Min Su; Kim, Woo-Hee

ArticleIssue Date2025CitationSurfaces and Interfaces, v.67, no.15, pp 1 - 7PublisherElsevier B.V.
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