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Thermal adsorption-enhanced atomic layer etching of Si3N4Go to Link

Kim, Woo-Hee; Sung, Dougyong; Oh, Sejin; Woo, Jehun; Lim, Seungkyu; Lee, Hyunju; Bent, Stacey F.

ArticleIssue Date2018CitationJournal of Vacuum Science and Technology A, v.36, no.1, pp.1 - 8PublisherAmerican Institute of Physics
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