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Abrasive and additive interactions in high selectivity STI CMP slurriesGo to Link

Praveen, B. V. S.; Manivannan, R.; Umashankar, T. D.; Cho, Byoung-Jun; Park, Jin-Goo; Ramanathan, S.

ArticleIssue Date2014CitationMicroelectronic Engineering, v.114, pp 98 - 104PublisherElsevier BV
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