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Investigation of Tunneling Current in SiO2/HfO2 Gate Stacks for Flash Memory ApplicationsGo to Link

Chakrabarti, Bhaswar; Kang, Heesoo; Brennan, Barry; Park, Tae Joo; Cantley, Kurtis D.; Pirkle, Adam; McDonnell, Stephen; Kim, Jiyoung; Wallace, Robert M.; Vogel, Eric M.

ArticleIssue Date2011CitationIEEE Transactions on Electron Devices, v.58, no.12, pp 4189 - 4195PublisherInstitute of Electrical and Electronics Engineers
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