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Source optimization for the whole arc slit with minimum optical proximity correction applied to contact hole patternsGo to Link

Yu, Da-Kyung; Kim, Min-Woo; Kim, Gug-Yong; Chae, Yu-Jin; Son, Seung-Woo; Yeung, Michael; Oh, Hye-Keun

ArticleIssue Date2024CitationINTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2024, v.13215, pp 1 - 13PublisherSPIE-INT SOC OPTICAL ENGINEERING
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