Ti-doped hydrogenated diamond like carbon coating deposited by hybrid physical vapor deposition and plasma enhanced chemical vapor deposition
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Na Rae | - |
dc.contributor.author | Jun, Yee Sle | - |
dc.contributor.author | Moon, Kyoung Il | - |
dc.contributor.author | Lee, Sunyong Caroline | - |
dc.date.accessioned | 2021-06-22T14:23:59Z | - |
dc.date.available | 2021-06-22T14:23:59Z | - |
dc.date.created | 2021-01-21 | - |
dc.date.issued | 2017-03 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/10111 | - |
dc.description.abstract | Diamond-like carbon films containing titanium and hydrogen (Ti-doped DLC: H) were synthesized using a hybrid technique based on physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD). The film was deposited under a mixture of argon (Ar) and acetylene gas (C2H2). The amount of Ti in the Ti-doped DLC: H film was controlled by varying the DC power of the Ti sputtering target ranging from 0 to 240W. The composition, microstructure, mechanical and chemical properties of Ti-doped DLC: H films with varying Ti concentrations, were investigated using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), nano indentation, a ball-on-disk tribometer, a four-point probe system and dynamic anodic testing. As a result, the optimum composition of Ti in Ti-doped DLC: H film using our hybrid method was found to be a Ti content of 18 at. %, having superior electrical conductivity and high corrosion resistance, suitable for bipolar plates. Its hardness value was measured to be 25.6GPa with a low friction factor. (C) 2017 The Japan Society of Applied Physics | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IOP Publishing Ltd | - |
dc.title | Ti-doped hydrogenated diamond like carbon coating deposited by hybrid physical vapor deposition and plasma enhanced chemical vapor deposition | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Sunyong Caroline | - |
dc.identifier.doi | 10.7567/JJAP.56.035506 | - |
dc.identifier.scopusid | 2-s2.0-85014378749 | - |
dc.identifier.wosid | 000395860900001 | - |
dc.identifier.bibliographicCitation | Japanese Journal of Applied Physics, v.56, no.3, pp.1 - 8 | - |
dc.relation.isPartOf | Japanese Journal of Applied Physics | - |
dc.citation.title | Japanese Journal of Applied Physics | - |
dc.citation.volume | 56 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 8 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | PULSED-LASER DEPOSITION | - |
dc.subject.keywordPlus | DLC FILMS | - |
dc.subject.keywordPlus | TRIBOLOGICAL PROPERTIES | - |
dc.subject.keywordPlus | ELECTRICAL-PROPERTIES | - |
dc.subject.keywordPlus | MECHANICAL-PROPERTIES | - |
dc.subject.keywordPlus | AMORPHOUS-CARBON | - |
dc.subject.keywordPlus | ATOMIC-STRUCTURE | - |
dc.subject.keywordPlus | BIAS VOLTAGE | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | EVAPORATION | - |
dc.identifier.url | https://iopscience.iop.org/article/10.7567/JJAP.56.035506 | - |
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