Ti-doped hydrogenated diamond like carbon coating deposited by hybrid physical vapor deposition and plasma enhanced chemical vapor deposition
- Authors
- Lee, Na Rae; Jun, Yee Sle; Moon, Kyoung Il; Lee, Sunyong Caroline
- Issue Date
- Mar-2017
- Publisher
- IOP Publishing Ltd
- Citation
- Japanese Journal of Applied Physics, v.56, no.3, pp.1 - 8
- Indexed
- SCIE
SCOPUS
- Journal Title
- Japanese Journal of Applied Physics
- Volume
- 56
- Number
- 3
- Start Page
- 1
- End Page
- 8
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/10111
- DOI
- 10.7567/JJAP.56.035506
- ISSN
- 0021-4922
- Abstract
- Diamond-like carbon films containing titanium and hydrogen (Ti-doped DLC: H) were synthesized using a hybrid technique based on physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD). The film was deposited under a mixture of argon (Ar) and acetylene gas (C2H2). The amount of Ti in the Ti-doped DLC: H film was controlled by varying the DC power of the Ti sputtering target ranging from 0 to 240W. The composition, microstructure, mechanical and chemical properties of Ti-doped DLC: H films with varying Ti concentrations, were investigated using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), nano indentation, a ball-on-disk tribometer, a four-point probe system and dynamic anodic testing. As a result, the optimum composition of Ti in Ti-doped DLC: H film using our hybrid method was found to be a Ti content of 18 at. %, having superior electrical conductivity and high corrosion resistance, suitable for bipolar plates. Its hardness value was measured to be 25.6GPa with a low friction factor. (C) 2017 The Japan Society of Applied Physics
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