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High-K Gate Dielectrics for CMOS Technology
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 박태주 | - |
| dc.date.accessioned | 2021-07-07T07:05:40Z | - |
| dc.date.available | 2021-07-07T07:05:40Z | - |
| dc.date.issued | 2012-08 | - |
| dc.identifier.isbn | 978-3-527-33032-4 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/103730 | - |
| dc.format.extent | 590 | - |
| dc.publisher | Wiley-VCH | - |
| dc.title | High-K Gate Dielectrics for CMOS Technology | - |
| dc.type | Book | - |
| dc.contributor.affiliatedAuthor | 박태주 | - |
| dc.type.rims | BOOK | - |
| dc.type.docType | 저서 | - |
| dc.description.isChapter | TRUE | - |
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Related Researcher
- Park, Tae Joo
- ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)