Engineering Silk Protein to Modulate Polymorphic Transitions for Green Lithography Resists
- Authors
- Chung, Soon-Chun; Park, Joon-Song; Jha, Rakesh Kumar; Kim, Jieun; Kim, Jinha; Kim, Muyoung; Choi, Juwan; Kim, Hongdeok; Park, Da-Hye; Gogurla, Narendar; Lee, Tae-Yun; Jeon, Heonsu; Park, Ji-Yong; Choi, Joonmyung; Kim, Ginam; Kim, Sunghwan
- Issue Date
- Dec-2022
- Publisher
- American Chemical Society (ACS)
- Keywords
- green photoresist; lithography; polymorphic transition; silk protein; synthetic biology
- Citation
- ACS Applied Materials & Interfaces, v.14, no.51, pp 56623 - 56634
- Pages
- 12
- Indexed
- SCIE
SCOPUS
- Journal Title
- ACS Applied Materials & Interfaces
- Volume
- 14
- Number
- 51
- Start Page
- 56623
- End Page
- 56634
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/111210
- DOI
- 10.1021/acsami.2c17843
- ISSN
- 1944-8244
1944-8252
- Abstract
- Silk protein is being increasingly introduced as a prospective material for biomedical devices. However, a limited locus to intervene in nature-oriented silk protein makes it challenging to implement on-demand functions to silk. Here, we report how polymorphic transitions are related with molecular structures of artificially synthesized silk protein and design principles to construct a green-lithographic and high-performative protein resist. The repetition number and ratio of two major building blocks in synthesized silk protein are essential to determine the size and content of β-sheet crystallites, and radicals resulting from tyrosine cleavages by the 193 nm laser irradiation induce the β-sheet to α-helix transition. Synthesized silk is designed to exclusively comprise homogeneous building blocks and exhibit high crystallization and tyrosine-richness, thus constituting an excellent basis for developing a high-performance deep-UV photoresist. Additionally, our findings can be conjugated to design an electron-beam resist governed by the different irradiation-protein interaction mechanisms. All synthesis and lithography processes are fully water-based, promising green lithography. Using the engineered silk, a nanopatterned planar color filter showing the reduced angle dependence can be obtained. Our study provides insights into the industrial scale production of silk protein with on-demand functions. © 2022 American Chemical Society.
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