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Current Boosting of Self-Aligned Top-Gate Amorphous InGaZnO Thin-Film Transistors under Driving Conditions

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dc.contributor.authorPark, Jingyu-
dc.contributor.authorChoi, Sungju-
dc.contributor.authorKim, Changwook-
dc.contributor.authorShin, Hong Jae-
dc.contributor.authorJeong, Yun Sik-
dc.contributor.authorBae, Jong Uk-
dc.contributor.authorOh, Chang Ho-
dc.contributor.authorOh, Saeroonter-
dc.contributor.authorKim, Dae Hwan-
dc.date.accessioned2023-05-03T09:37:18Z-
dc.date.available2023-05-03T09:37:18Z-
dc.date.issued2023-03-
dc.identifier.issn2199-160X-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/112629-
dc.description.abstractOxide semiconductor transistors control the brightness and color of organic light-emitting diode (OLED) displays in large-screen televisions to portable telecommunications devices. Oxide semiconductor thin-film transistors under driving conditions are required to maintain a steady current through the OLED for constant illuminance. Interestingly, for driving conditions under strong saturation where both gate and drain bias are high, a boosting phenomenon of the drain current is discovered, even with compensation of the threshold voltage. In this paper, the current boosting effect of self-aligned InGaZnO transistors under driving conditions is comprehensively investigated. Based on experimental extraction methods, two distinct regions within the device are identified: an electron-capture-dominant region including electron trapping in the gate insulator and O-O dimer bond-breaking, and an electron-emission-dominant region caused by peroxide formation. A dual-transistor-in-series model is proposed, where each region is modeled as a local transistor. The current boosting phenomena as a function of time are well-reproduced for various channel length devices, which validate the accuracy of the model. Better understanding of the underlying mechanisms enables increased effectiveness of compensation schemes for transistors under long-term current-driving conditions.-
dc.format.extent10-
dc.language영어-
dc.language.isoENG-
dc.publisherWiley-VCH Verlag-
dc.titleCurrent Boosting of Self-Aligned Top-Gate Amorphous InGaZnO Thin-Film Transistors under Driving Conditions-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1002/aelm.202201109-
dc.identifier.scopusid2-s2.0-85146154823-
dc.identifier.wosid000911373100001-
dc.identifier.bibliographicCitationAdvanced Electronic Materials, v.9, no.3, pp 1 - 10-
dc.citation.titleAdvanced Electronic Materials-
dc.citation.volume9-
dc.citation.number3-
dc.citation.startPage1-
dc.citation.endPage10-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusSTRESS INSTABILITY-
dc.subject.keywordAuthoramorphous InGaZnO-
dc.subject.keywordAuthorcurrent boosting-
dc.subject.keywordAuthordriver-
dc.subject.keywordAuthoroxide semiconductors-
dc.subject.keywordAuthorself-aligned-
dc.subject.keywordAuthorthin-film transistors-
dc.identifier.urlhttps://onlinelibrary.wiley.com/doi/10.1002/aelm.202201109-
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