Current Boosting of Self-Aligned Top-Gate Amorphous InGaZnO Thin-Film Transistors under Driving Conditions
DC Field | Value | Language |
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dc.contributor.author | Park, Jingyu | - |
dc.contributor.author | Choi, Sungju | - |
dc.contributor.author | Kim, Changwook | - |
dc.contributor.author | Shin, Hong Jae | - |
dc.contributor.author | Jeong, Yun Sik | - |
dc.contributor.author | Bae, Jong Uk | - |
dc.contributor.author | Oh, Chang Ho | - |
dc.contributor.author | Oh, Saeroonter | - |
dc.contributor.author | Kim, Dae Hwan | - |
dc.date.accessioned | 2023-05-03T09:37:18Z | - |
dc.date.available | 2023-05-03T09:37:18Z | - |
dc.date.issued | 2023-03 | - |
dc.identifier.issn | 2199-160X | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/112629 | - |
dc.description.abstract | Oxide semiconductor transistors control the brightness and color of organic light-emitting diode (OLED) displays in large-screen televisions to portable telecommunications devices. Oxide semiconductor thin-film transistors under driving conditions are required to maintain a steady current through the OLED for constant illuminance. Interestingly, for driving conditions under strong saturation where both gate and drain bias are high, a boosting phenomenon of the drain current is discovered, even with compensation of the threshold voltage. In this paper, the current boosting effect of self-aligned InGaZnO transistors under driving conditions is comprehensively investigated. Based on experimental extraction methods, two distinct regions within the device are identified: an electron-capture-dominant region including electron trapping in the gate insulator and O-O dimer bond-breaking, and an electron-emission-dominant region caused by peroxide formation. A dual-transistor-in-series model is proposed, where each region is modeled as a local transistor. The current boosting phenomena as a function of time are well-reproduced for various channel length devices, which validate the accuracy of the model. Better understanding of the underlying mechanisms enables increased effectiveness of compensation schemes for transistors under long-term current-driving conditions. | - |
dc.format.extent | 10 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | Wiley-VCH Verlag | - |
dc.title | Current Boosting of Self-Aligned Top-Gate Amorphous InGaZnO Thin-Film Transistors under Driving Conditions | - |
dc.type | Article | - |
dc.publisher.location | 미국 | - |
dc.identifier.doi | 10.1002/aelm.202201109 | - |
dc.identifier.scopusid | 2-s2.0-85146154823 | - |
dc.identifier.wosid | 000911373100001 | - |
dc.identifier.bibliographicCitation | Advanced Electronic Materials, v.9, no.3, pp 1 - 10 | - |
dc.citation.title | Advanced Electronic Materials | - |
dc.citation.volume | 9 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 1 | - |
dc.citation.endPage | 10 | - |
dc.type.docType | Article | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | STRESS INSTABILITY | - |
dc.subject.keywordAuthor | amorphous InGaZnO | - |
dc.subject.keywordAuthor | current boosting | - |
dc.subject.keywordAuthor | driver | - |
dc.subject.keywordAuthor | oxide semiconductors | - |
dc.subject.keywordAuthor | self-aligned | - |
dc.subject.keywordAuthor | thin-film transistors | - |
dc.identifier.url | https://onlinelibrary.wiley.com/doi/10.1002/aelm.202201109 | - |
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