Current Boosting of Self-Aligned Top-Gate Amorphous InGaZnO Thin-Film Transistors under Driving Conditions
- Authors
- Park, Jingyu; Choi, Sungju; Kim, Changwook; Shin, Hong Jae; Jeong, Yun Sik; Bae, Jong Uk; Oh, Chang Ho; Oh, Saeroonter; Kim, Dae Hwan
- Issue Date
- Mar-2023
- Publisher
- Wiley-VCH Verlag
- Keywords
- amorphous InGaZnO; current boosting; driver; oxide semiconductors; self-aligned; thin-film transistors
- Citation
- Advanced Electronic Materials, v.9, no.3, pp 1 - 10
- Pages
- 10
- Indexed
- SCIE
SCOPUS
- Journal Title
- Advanced Electronic Materials
- Volume
- 9
- Number
- 3
- Start Page
- 1
- End Page
- 10
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/112629
- DOI
- 10.1002/aelm.202201109
- ISSN
- 2199-160X
- Abstract
- Oxide semiconductor transistors control the brightness and color of organic light-emitting diode (OLED) displays in large-screen televisions to portable telecommunications devices. Oxide semiconductor thin-film transistors under driving conditions are required to maintain a steady current through the OLED for constant illuminance. Interestingly, for driving conditions under strong saturation where both gate and drain bias are high, a boosting phenomenon of the drain current is discovered, even with compensation of the threshold voltage. In this paper, the current boosting effect of self-aligned InGaZnO transistors under driving conditions is comprehensively investigated. Based on experimental extraction methods, two distinct regions within the device are identified: an electron-capture-dominant region including electron trapping in the gate insulator and O-O dimer bond-breaking, and an electron-emission-dominant region caused by peroxide formation. A dual-transistor-in-series model is proposed, where each region is modeled as a local transistor. The current boosting phenomena as a function of time are well-reproduced for various channel length devices, which validate the accuracy of the model. Better understanding of the underlying mechanisms enables increased effectiveness of compensation schemes for transistors under long-term current-driving conditions.
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