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Effect of Surfactant in Gas Dissolved Cleaning Solutions on Acoustic Bubble Dynamics

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dc.contributor.authorHan, Soyoung-
dc.contributor.authorYerriboina, Nagendra Prasad-
dc.contributor.authorSahoo, Bichitra Nanda-
dc.contributor.authorKang, Bong Kyun-
dc.contributor.authorKlipp, Andreas-
dc.contributor.authorPark, Jin Goo-
dc.date.accessioned2023-07-05T06:30:58Z-
dc.date.available2023-07-05T06:30:58Z-
dc.date.issued2021-02-
dc.identifier.issn1012-0394-
dc.identifier.issn1662-9779-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/113551-
dc.description.abstractMegasonic cleaning is one of the promising technologies to remove the particles during semiconductor processing. Acoustic bubble cavitation plays a key role in removing the particles. In this work, the effect of an anionic surfactant sodium dodecyl sulfate (SDS) on a bubble in the presence of hydrogen dissolved DIW water was studied. The bubble dynamics were observed using a highspeed camera. It was found that with the increase of surfactant the bubble characteristics were changed very significantly. Several parameters affecting the bubble dynamics were investigated.-
dc.format.extent5-
dc.language영어-
dc.language.isoENG-
dc.publisherScientific.net-
dc.titleEffect of Surfactant in Gas Dissolved Cleaning Solutions on Acoustic Bubble Dynamics-
dc.typeArticle-
dc.publisher.location스위스-
dc.identifier.doi10.4028/www.scientific.net/SSP.314.197-
dc.identifier.scopusid2-s2.0-85101976800-
dc.identifier.bibliographicCitationSolid State Phenomena, v.314, pp 197 - 201-
dc.citation.titleSolid State Phenomena-
dc.citation.volume314-
dc.citation.startPage197-
dc.citation.endPage201-
dc.type.docType정기학술지(Article(Perspective Article포함))-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscopus-
dc.subject.keywordPlusBubbles (in fluids)-
dc.subject.keywordPlusCleaning-
dc.subject.keywordPlusSulfur compounds-
dc.subject.keywordPlusBubble cavitation-
dc.subject.keywordPlusBubble characteristics-
dc.subject.keywordPlusBubble dynamics-
dc.subject.keywordPlusCleaning solution-
dc.subject.keywordPlusMegasonic cleaning-
dc.subject.keywordPlusSemiconductor processing-
dc.subject.keywordPlusSodium dodecyl sulfate-
dc.subject.keywordAuthorAcoustic cavitation-
dc.subject.keywordAuthorAnionic Surfactant-
dc.subject.keywordAuthorEUV mask cleaning-
dc.subject.keywordAuthorMegasonic cleaning-
dc.identifier.urlhttps://www.scientific.net/SSP.314.197-
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ERICA 공학대학 (DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING)
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