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Frank–van der Merwe Growth versus Volmer–Weber Growth in Successive Stacking of a Few-Layer Bi2Te3/Sb2Te3 by van der Waals Heteroepitaxy: The Critical Roles of Finite Lattice-Mismatch with Seed Substrates

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dc.contributor.authorHeo, Hoseok-
dc.contributor.authorSung, Ji Ho-
dc.contributor.authorAhn, Ji-Hoon-
dc.contributor.authorGhahari, Fereshte-
dc.contributor.authorTaniguchi, Takashi-
dc.contributor.authorWatanabe, Kenji-
dc.contributor.authorKim, Philip-
dc.contributor.authorJo, Moon Ho-
dc.date.accessioned2021-06-22T15:22:04Z-
dc.date.available2021-06-22T15:22:04Z-
dc.date.issued2017-01-
dc.identifier.issn2199-160X-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/11561-
dc.description.abstractDifferent growth mechanisms of van der Waals heteroepitaxial 2D Bi2Te3/Sb2Te3 stacking by choosing different substrates are reported. Sequential Bi2Te3/Sb2Te3 stacking growth mode becomes layer-by-layer growth on h-BN substrates, and 3D island growth on SiO2/Si. Compressive strain in the h-BN substrates imposed by the lattice mismatch plays a crucial role to determine different growth modes in these 2D nucleation kinetics models.-
dc.format.extent7-
dc.language영어-
dc.language.isoENG-
dc.publisherWiley-VCH Verlag-
dc.titleFrank–van der Merwe Growth versus Volmer–Weber Growth in Successive Stacking of a Few-Layer Bi2Te3/Sb2Te3 by van der Waals Heteroepitaxy: The Critical Roles of Finite Lattice-Mismatch with Seed Substrates-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1002/aelm.201600375-
dc.identifier.scopusid2-s2.0-85009997029-
dc.identifier.wosid000394901900005-
dc.identifier.bibliographicCitationAdvanced Electronic Materials, v.3, no.2, pp 1 - 7-
dc.citation.titleAdvanced Electronic Materials-
dc.citation.volume3-
dc.citation.number2-
dc.citation.startPage1-
dc.citation.endPage7-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusVAPOR-DEPOSITION GROWTH-
dc.subject.keywordPlusEPITAXIAL-GROWTH-
dc.subject.keywordPlusVERTICAL HETEROSTRUCTURES-
dc.subject.keywordPlusSURFACE-STATES-
dc.subject.keywordPlusMONOLAYER MOS2-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusDIFFUSION-
dc.subject.keywordPlusGRAPHENE-
dc.subject.keywordPlusKINETICSSTRAIN-
dc.subject.keywordAuthor2D materials-
dc.subject.keywordAuthormetal chalcogenide-
dc.subject.keywordAuthorsuperlattice-
dc.subject.keywordAuthorthin film growth modes-
dc.subject.keywordAuthorvan der Waals epitaxy-
dc.identifier.urlhttps://onlinelibrary.wiley.com/doi/10.1002/aelm.201600375-
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ERICA 첨단융합대학 (ERICA 신소재·반도체공학전공)
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