Contamination Removal From UV and EUV Photomasks
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Venkatesh, R. Prasanna | - |
dc.contributor.author | Kim, Min su | - |
dc.contributor.author | Park, Jin-Goo | - |
dc.date.accessioned | 2021-06-22T15:23:26Z | - |
dc.date.available | 2021-06-22T15:23:26Z | - |
dc.date.created | 2021-01-22 | - |
dc.date.issued | 2017 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/11625 | - |
dc.description.abstract | In semiconductor fabrication industries, photomask cleaning with no pattern damage is a critical issue, especially for advanced technology nodes. Thus, optimization of cleaning techniques adopted for photomask cleaning or development of new cleaning technique is always of great interest to meet process requirements. In this book chapter, the sources of contaminants on photomask and their impact on imprinted images are first discussed. Then a critical review is presented on the wide spectrum of cleaning techniques and strategies that are adopted for the removal of particulate contaminants and organics from the photomask. The applicability of each technique and its limitations are also examined. Because extreme ultraviolet lithography (EUVL) is considered to be a next-generation lithography, a separate section is devoted to EUVL mask-cleaning techniques. © 2017 Elsevier Inc. All rights reserved. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | Elsevier Inc. | - |
dc.title | Contamination Removal From UV and EUV Photomasks | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Park, Jin-Goo | - |
dc.identifier.doi | 10.1016/B978-0-323-43157-6.00005-7 | - |
dc.identifier.scopusid | 2-s2.0-85027140926 | - |
dc.identifier.bibliographicCitation | Developments in Surface Contamination and Cleaning, v.9, pp.135 - 173 | - |
dc.relation.isPartOf | Developments in Surface Contamination and Cleaning | - |
dc.citation.title | Developments in Surface Contamination and Cleaning | - |
dc.citation.volume | 9 | - |
dc.citation.startPage | 135 | - |
dc.citation.endPage | 173 | - |
dc.type.rims | ART | - |
dc.type.docType | Book Chapter | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | Extreme ultraviolet lithography | - |
dc.subject.keywordPlus | Masks | - |
dc.subject.keywordPlus | Photomasks | - |
dc.subject.keywordPlus | Aerosol cleaning | - |
dc.subject.keywordPlus | EUVL masks | - |
dc.subject.keywordPlus | Megasonic cleaning | - |
dc.subject.keywordPlus | Organics removal | - |
dc.subject.keywordPlus | Particle removal | - |
dc.subject.keywordPlus | Spray cleaning | - |
dc.subject.keywordPlus | Surface cleaning | - |
dc.subject.keywordAuthor | Aerosol cleaning | - |
dc.subject.keywordAuthor | Cleaning techniques | - |
dc.subject.keywordAuthor | EUVL mask | - |
dc.subject.keywordAuthor | Jet spray cleaning | - |
dc.subject.keywordAuthor | Megasonic cleaning | - |
dc.subject.keywordAuthor | Organics removal | - |
dc.subject.keywordAuthor | Ozone cleaning | - |
dc.subject.keywordAuthor | Particle removal | - |
dc.subject.keywordAuthor | Photomask | - |
dc.subject.keywordAuthor | SPM cleaning | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269 sweetbrain@hanyang.ac.kr
COPYRIGHT © 2021 HANYANG UNIVERSITY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.