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Selective removal of EUV-exposed particles from pellicle
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김태곤 | - |
| dc.date.accessioned | 2024-01-10T18:06:32Z | - |
| dc.date.available | 2024-01-10T18:06:32Z | - |
| dc.date.issued | 2023-03-01 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/116783 | - |
| dc.title | Selective removal of EUV-exposed particles from pellicle | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | SPIE Advanced Lithography and Patterning | - |
| dc.citation.conferencePlace | San Jose, USA | - |
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Related Researcher
- KIM, TAE GON
- ERICA 공학대학 (MAJOR IN APPLIED MATERIAL & COMPONENTS)