ScholarWorks@Hanyang University ERICA Campus

2. Conference Papers(COLLEGE OF ENGINEERING SCIENCES > MAJOR IN APPLIED MATERIAL & COMPONENTS > 2. Conference Papers)23

Browse
rss_1.0 rss_2.0 atom_1.0

Subscribe to this collection to receive daily e-mail notification of new additions

Collection's Items (Sorted by Issue Date in Descending order): 1 to 20 of 23

Investigation and Characterization of Mo Surface during Mo Post-CMP Cleaning Process

김태곤

ConferenceIssue Date2023PlaceBusan, Korea
Effect of Colloidal Silica and Molybdenum Ions on PVA Brush Loading during Mo Post-CMP Cleaning

김태곤

ConferenceIssue Date2023PlaceBusan, Korea
Characterization of Alkaline Cu/Ti Slurry for TSV Chemical Mechanical Planarization

김태곤

ConferenceIssue Date2023PlaceBusan, Korea
Effect of Organic Amine on Ceria Contamination for Nitride Surface During STI CMP

김태곤

ConferenceIssue Date2023PlaceBusan, Korea
A Novel Method to Evaluate the Contact Area of PVA Brushes during Post-CMP Cleaning

김태곤

ConferenceIssue Date2023PlaceBusan, Korea
Investigation of Surface Chemistry of 4H-SiC during RCA Cleaning Processes

김태곤

ConferenceIssue Date2023PlaceBusan, Korea
Effect of Cleaning Chemicals on Defects of PVA Brush during Post-CMP Cleaning

김태곤

ConferenceIssue Date2023PlaceKanazawa, Japan
Effect of etchants and oxidizers on the Molybdenum surfaces during post-CMP cleaning process

김태곤

ConferenceIssue Date2023PlaceKanazawa, Japan
Evaluation and effective removal of organic impurity sources during the synthesis process of roller-type PVA brushes for efficient post-CMP cleaning

김태곤

ConferenceIssue Date2023PlaceKanazawa, Japan
A novel approach for PVA brush evaluation by contact area analysis during metal and oxide post-CMP cleaning

김태곤

ConferenceIssue Date2023PlaceKanazawa, Japan
Contact and non-contact PVA brush conditioning during oxide and metal post-CMP cleaning

김태곤

ConferenceIssue Date2023PlaceKanazawa, Japan
Pinpoint particle removal for EUV Pellicle Productivity Enhancement

김태곤

ConferenceIssue Date2023PlaceBrugge, Belgium
Investigation of Selective Wet Etching of SiGe Substrates for High-Performance Device Manufacturing

김태곤

ConferenceIssue Date2023PlaceBrugge, Belgium
Selective removal of EUV-exposed particles from pellicle

김태곤

ConferenceIssue Date2023PlaceSan Jose, USA
Characterization of Wetting Behavior on High Aspect Ratio Multilayer Structure

김태곤

ConferenceIssue Date2022PlaceVancouver, Canada
An Analysis Method of the Wetting Characteristic of High Aspect Ratio Structure

김태곤

ConferenceIssue Date2021
Effect of particle Agglomeration by Air bubble during Tungsten (W) CMP Process

김태곤

ConferenceIssue Date2020
DHF을 사용한 Brush scrubbing에 발생하는 PVA brush의 변화 연구

김태곤

ConferenceIssue Date2020
Mechanisms of Colloidal Ceria Contamination and Cleaning during Oxide Post-CMP

김태곤

ConferenceIssue Date2020
Study on PVA Brush Particle Loading during Post CMP Cleaning

김태곤

ConferenceIssue Date2020
1 2

Discover

Author

Type

STATISTICS
Total View :0
Today View :0

RSS_1.0 RSS_2.0 ATOM_1.0

CONTACT US

55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269

COPYRIGHT © 2021 HANYANG UNIVERSITY. ALL RIGHTS RESERVED.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.

BROWSE

한국어