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Effect of Cleaning Chemicals on Defects of PVA Brush during Post-CMP Cleaning
- Authors
- 김태곤
- Issue Date
- 1-Nov-2023
- Place
- Kanazawa, Japan
- Conference Name
- International Conference on Planarization CMP Technology
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Related Researcher
- KIM, TAE GON
- ERICA 공학대학 (MAJOR IN APPLIED MATERIAL & COMPONENTS)