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Impact of the Non-Ideal Extreme Ultra-Violet (EUV) Mask Stack for 1x nm Patterning and the Effect on the Anamorphic High-NA lithography
- Authors
- 오혜근
- Issue Date
- 20-Sep-2016
- Publisher
- Danube University
- Citation
- 42nd Micro and Nano Engineering
- Conference Name
- 42nd Micro and Nano Engineering
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