A novel approach for PVA brush evaluation by contact area analysis during metal and oxide post-CMP cleaning
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 김태곤 | - |
dc.date.accessioned | 2024-02-10T08:30:55Z | - |
dc.date.available | 2024-02-10T08:30:55Z | - |
dc.date.issued | 2023-11-01 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/118095 | - |
dc.title | A novel approach for PVA brush evaluation by contact area analysis during metal and oxide post-CMP cleaning | - |
dc.type | Conference | - |
dc.citation.conferenceName | International Conference on Planarization CMP Technology | - |
dc.citation.conferencePlace | Kanazawa, Japan | - |
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