All-atomic scale design for negative photoresist: A computational study

최준명

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All-atomic scale design for negative photoresist: A computational study

Authors: 최준명

Issue Date: 18-Jun-2024

URI: https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/120454

Place: Waterside hotel, Wuzhen, Zhejiang, China

Conference Name: 6th International Conference on Applied Surface Science (ICASS 2024)

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Appears in Collections: COLLEGE OF ENGINEERING SCIENCES > DEPARTMENT OF MECHANICAL ENGINEERING > 2. Conference Papers

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